Rare Earth Doped III-V Semiconductor for Optoelectronics

Award Information
Agency: Department of Defense
Branch: Missile Defense Agency
Contract: N/A
Agency Tracking Number: 19596
Amount: $65,000.00
Phase: Phase I
Program: SBIR
Awards Year: 1993
Solicitation Year: N/A
Solicitation Topic Code: N/A
Solicitation Number: N/A
Small Business Information
Astralux
2386 Vassar Drive, Boulder, CO, 80303
DUNS: N/A
HUBZone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: N
Principal Investigator
 Chang Qiu
 (303) 786-0623
Business Contact
Phone: () -
Research Institution
N/A
Abstract
THE PROPOSED RESEARCH AND DEVELOPMENT EFFORT WILL EXPLORE THE ELECTROLUMINESCENCE PROPERTIES OF RARE EARTH ELEMENTS IN A III-V SEMICONDUCTOR. THE TECHNIQUE OF IMPACT EXCITATION, CURRENTLY USED IN COMMERCIALLY AVAILABLE ELECTROLUMINESCENCE DISPLAY DEVICES, WILL BE STUDIED FOR EXCITING THE RARE EARTHS. WE HAVE ALREADY DEMONSTRATED THE POSSIBILITY OF GENERATING VISIBLE LIGHT BY HOT ELECTRON IMPACT EXCITATION IN A III-V SEMICONDUCTOR. WE PROPOSE TO INTRODUCE ERBIUM (Er) ATOMS INTO A III-V SEMICONDUCTOR AS A LUMINESCENT SOURCE FOR 1.55UM LIGHT EMISSION. PREVIOUSLY FABRICATED ON-HAND DEVICES WILL BE DOPED WITH Er ATOMS BY ION BEAM IMPLANTATION TECHNIQUES. THIS WILL PERMIT RAPID EVALUATION OF THE EFFICIENCY OF ELECTRICALLY EXCITING Er LUMINESCENCE. WE WILL ALSO GROW NEW STRUCTURES BY THE PLASMA-ASSISTED CHEMICAL VAPOR DEPOSITION METHOD INCORPORATING A METALORGANIC SOURCE OF Er. THIS ALLOWS GROWTH OF Er-DOPED SEMICONDUCTORS AT LOW TEMPERATURES, THUS MINIMIZING THERMALLY-INDUCED STRESSES. THESE SAMPLE WILL BE CHARACTERIZED BY A NUMBER OF ANALYTIC METHODS AND COMPARED TO THE ION IMPLANTED/HIGH-TEMPERATURE ANNEALED MATERIAL.

* information listed above is at the time of submission.

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