Growth of a Boule of GaN

Award Information
Agency:
Department of Defense
Branch
Missile Defense Agency
Amount:
$64,999.00
Award Year:
2001
Program:
SBIR
Phase:
Phase I
Contract:
F33615-01-M-5418
Award Id:
53116
Agency Tracking Number:
01-0306
Solicitation Year:
n/a
Solicitation Topic Code:
n/a
Solicitation Number:
n/a
Small Business Information
2500 Central Ave., Boulder, CO, 80301
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N
Duns:
940915358
Principal Investigator:
Jacques Pankove
V.P. for Research and Tec
(303) 413-1440
pankove@astraluxinc.com
Business Contact:
Ethel Pankove
President
(303) 494-0670
ethel@astraluxinc.com
Research Institute:
n/a
Abstract
A recent workshop on wide bandgap semiconductors concluded there is still an urgent need for a GaN single crystal boule. Such a boule would allow the fabrication of single crystal wafers of high quality GaN for the epitaxial growth of high qualitydevices and integrated circuits for numerous applications from short wavelength lasers, high performance transistors to UV/XRay detectors. Astralux, with support from AFSOR and DARPA. has done preliminary work on the growth of GaN single crystals,demonstrating the possibility of fast growth of at least 0.4 mm/hr. More importantly the key problems to overcome for a successful boule growth were clearly identified and the solution to these challenges were defined, before the funding ran out. Now,Astralux aims for a successful multistage attack on this vital problem. First, there is a need to demonstrate a controlled growth rate. Second, the choice of a high quality seed is critical. Third, the distribution of reactants over the growth area mustbe properly controlled. Finally, a more powerful rf generator must be set up. Astralux proposes to do this final stage with the collaboration of a large U.S. corporation.A single crystal boule of high quality GaN will allow production of wafers of high quality GaN for the epitaxial growth of devices and ICs.

* information listed above is at the time of submission.

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