THIN CRYSTALLINE INDIUM-PHOSPHIDE ON INSULATING SUBSTRATES

Award Information
Agency: Department of Defense
Branch: Missile Defense Agency
Contract: N/A
Agency Tracking Number: 9467
Amount: $487,000.00
Phase: Phase II
Program: SBIR
Awards Year: 1990
Solicitation Year: N/A
Solicitation Topic Code: N/A
Solicitation Number: N/A
Small Business Information
Astro-systems Inc.*
30 Lovett Ave, Newark, DE, 19711
DUNS: N/A
HUBZone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: N
Principal Investigator
 James B Mcneely
 (302) 366-0400
Business Contact
Phone: () -
Research Institution
N/A
Abstract
UNIFORM LARGE AREA, DEVICE QUALITY INDIUM PHOSPHIDE (INP) EPITAXIAL LAYERS ON INSULATING SUBSTRATES COULD LEAD TO THE DEVELOPMENT OF A NEW GENERATION OF PRODUCIBLE, RADIATION-HARDENED MICROELECTRONIC AND OPTOELECTRONIV INTEGRATED CIRCUITS. INP ALLOYS OFFER THE ADVANTAGES OF: PROVEN RESISTANCE TO RADIATION DAMAGE; LOWER SURFACE RECOMBINATION THAN GAAS; HIGH PEAK ELECTRON VELOCITY; AND BANDGAPS THAT MATCH THE LOW-ATTENUATION WINDOW IN SILICA-BASED OPTICAL WAVEGUIDES. IN THIS STUDY, A SIMPLE METHOD OF GROWING CRYSTALLINE INP HETEROLAYERS ON INSULATING SUBSTRATES IS BEING INVESTIGATED. THIS INVESTIGATION APPLIES SOME OF THE TECHNOLOGIES DEVELOPED IN PRODUCING GAAS/SI HETEROSTRUCTURES. THE SUCCESSFUL DEMONSTRATION OF THIS CONCEPT WILL ALLOW THE DEVELOPMENT OF RADIATION-HARD, VLSI MICROELECTRONIC COMPONENTS INCORPORATING INP-ON-INSULATOR TECHNOLOGY. APPLICATIONS FORTHIS TECHNOLOGY INCLUDE NEURAL NETWORK LOGIC AND OPTICAL INTERCONNECT/PROCESSING SCHEMES.

* information listed above is at the time of submission.

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