"ELECTRO-DEPOSITION OF SILICON FILMS FROM LIQUID-METAL SOLUTIONS FOR PHOTOVOLTAIC APPLICATIONS"

Award Information
Agency:
Department of Energy
Branch
n/a
Amount:
$50,000.00
Award Year:
1990
Program:
SBIR
Phase:
Phase I
Contract:
n/a
Award Id:
11670
Agency Tracking Number:
11670
Solicitation Year:
n/a
Solicitation Topic Code:
n/a
Solicitation Number:
n/a
Small Business Information
30 Lovett Avenue, Wilmington, DE, 19711
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N
Duns:
n/a
Principal Investigator:
() -
Business Contact:
() -
Research Institution:
n/a
Abstract
ELECTRO-DEPOSITION OF SILICON FILMS FROM LIQUID-METAL SOLUTIONS WILL BE INVESTIGATED. THE OBJECTIVE IS TO DEVELOP A LOW-COST PROCESS FOR THE PRODUCTION OF HIGH-EFFICIENCY THIN-FILM PHOTOVOLTAIC DEVICES. SPECIFICALLY, CURRENT-CONTROLLED GROWTH OF A SILICON FILM ON A SUBSTRATE IS ACCOMPLISHED USING A LIQUID-METAL SOLUTION, SUCH AS TIN, AND A SILICON SOURCE ELECTRODE. THE QUALITY OF SILICON GROWN FROM TIN IS GOOD. THE PHASE I WORK FOCUSES ON ELECTRO-EPITAXY OF SILICON FILMS ON MONOCRYSTALLINE AND POLYCRYSTALLINE SILICON SUBSTRATES. IN ADDITION, EPITAXIAL LATERAL OVERGROWTH ON PATTERNED, OXIDE-MASKED SILICON SUBSTRATES WILL BE INVESTIGATED. FEASIBILITY STUDIES FOR ELECTRO-DEPOSITION OF SILICON ON LOW-COST CERAMIC SUBSTRATES WILL ALSO BE INCLUDED. ELCTRO-DEPOSITED SILICON FILMS WILL BE CHARACTERIZED STRUCTURALLY, CHEMICALLY, AND ELECTRICALLY. PHOTOVOLTAIC DEVICES WILL BE FABRICATED TO EVALUATE THE ELECTRO-DEPOSITEDSILICON FILMS.

* information listed above is at the time of submission.

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