"ELECTRO-DEPOSITION OF SILICON FILMS FROM LIQUID-METAL SOLUTIONS FOR PHOTOVOLTAIC APPLICATIONS"

Award Information
Agency: Department of Energy
Branch: N/A
Contract: N/A
Agency Tracking Number: 11670
Amount: $50,000.00
Phase: Phase I
Program: SBIR
Awards Year: 1990
Solicitation Year: N/A
Solicitation Topic Code: N/A
Solicitation Number: N/A
Small Business Information
Astropower Inc
30 Lovett Avenue, Wilmington, DE, 19711
DUNS: N/A
HUBZone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: N
Principal Investigator
 () -
Business Contact
Phone: () -
Research Institution
N/A
Abstract
ELECTRO-DEPOSITION OF SILICON FILMS FROM LIQUID-METAL SOLUTIONS WILL BE INVESTIGATED. THE OBJECTIVE IS TO DEVELOP A LOW-COST PROCESS FOR THE PRODUCTION OF HIGH-EFFICIENCY THIN-FILM PHOTOVOLTAIC DEVICES. SPECIFICALLY, CURRENT-CONTROLLED GROWTH OF A SILICON FILM ON A SUBSTRATE IS ACCOMPLISHED USING A LIQUID-METAL SOLUTION, SUCH AS TIN, AND A SILICON SOURCE ELECTRODE. THE QUALITY OF SILICON GROWN FROM TIN IS GOOD. THE PHASE I WORK FOCUSES ON ELECTRO-EPITAXY OF SILICON FILMS ON MONOCRYSTALLINE AND POLYCRYSTALLINE SILICON SUBSTRATES. IN ADDITION, EPITAXIAL LATERAL OVERGROWTH ON PATTERNED, OXIDE-MASKED SILICON SUBSTRATES WILL BE INVESTIGATED. FEASIBILITY STUDIES FOR ELECTRO-DEPOSITION OF SILICON ON LOW-COST CERAMIC SUBSTRATES WILL ALSO BE INCLUDED. ELCTRO-DEPOSITED SILICON FILMS WILL BE CHARACTERIZED STRUCTURALLY, CHEMICALLY, AND ELECTRICALLY. PHOTOVOLTAIC DEVICES WILL BE FABRICATED TO EVALUATE THE ELECTRO-DEPOSITEDSILICON FILMS.

* information listed above is at the time of submission.

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