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NOTE: The Solicitations and topics listed on this site are copies from the various SBIR agency solicitations and are not necessarily the latest and most up-to-date. For this reason, you should visit the respective agency SBIR sites to read the official version of the solicitations and download the appropriate forms and rules.

  1. DMEA152-002: Analysis of Integrated Circuits Using Limited X-rays

    Release Date: 04-24-2015Open Date: 05-22-2015Due Date: 06-24-2015Close Date: 06-24-2015

    The DARPA TRUST program established the potential usefulness of using an X-Ray microscope to analyze ICs at a synchrotron. We would like to further that development using a lab based X-Ray source. When utilizing a lab X-ray source, acquisition times for X-ray images increase significantly compared to using a synchrotron X-ray source. This is due to the decreased number of X-ray photons (i.e., X-ra ...

    SBIRPhase IDepartment of DefenseDefense Microelectronics Activity
  2. DMEA192-002: Applications of Machine Learning and Machine Vision to Determine the Authenticity and Security of Microelectronics Parts in Weapons Systems

    Release Date: 05-02-2019Open Date: 05-31-2019Due Date: 07-01-2019Close Date: 07-01-2019

    TECHNOLOGY AREA(S): Info Systemssensors, Electronics, Battlespace OBJECTIVE: Design and implement machine learning or machine vision technologies to determine the authenticity and security of microelectronics parts in weapon systems. These technologies may be purely software based or include a hardware component. DESCRIPTION: Determining the authenticity and security of microelectronics parts i ...

    SBIRPhase I/Phase IIDepartment of DefenseDefense Microelectronics Activity
  3. DMEA23C-P001: Applications to Assist in Analysis and Re-Engineering of Printed Circuit Board Assemblies

    Release Date: 08-23-2023Open Date: 09-20-2023Due Date: 10-18-2023Close Date: 10-18-2023

    OUSD (R&E) CRITICAL TECHNOLOGY AREA(S): Microelectronics OBJECTIVE: Design and implement technologies to assist in the process of extracting a printed circuit board design non-destructively from a printed circuit board assembly. These technologies may be purely software based or include a hardware component. DESCRIPTION: The weapons systems of the Department of Defense (DoD) rely heavily on mic ...

    STTRPhase IDepartment of DefenseDefense Microelectronics Activity
  4. DMEA18B-001: Automated In-situ Large-area De-processing of ICs with High Throughput

    Release Date: 04-20-2018Open Date: 05-22-2018Due Date: 06-20-2018Close Date: 06-20-2018

    TECHNOLOGY AREA(S): Materials, Sensors, Eletronics OBJECTIVE: Develop an automated & high throughput technology, which performs similar to the gas assisted etch (GAE) focused ion beam (FIB)-scanning electron microscope (SEM) for delayering an entire IC to perform 3D chip reconstruction for use in reverse engineering and physical failure analysis applications. DESCRIPTION: De-processing of Inte ...

    STTRPhase I/Phase IIDepartment of DefenseDefense Microelectronics Activity
  5. DMEA231-008: Automated Measurement of Passive Devices in Printed Circuit Assemblies

    Release Date: 01-11-2023Open Date: 02-08-2023Due Date: 03-08-2023Close Date: 03-08-2023

    OUSD (R&E) CRITICAL TECHNOLOGY AREA(S): Microelectronics OBJECTIVE: Design and implement a system that would automate the measurement of passive electronic components (capacitors, inductors, and resistors). The components can be measured in place or removed and measured in an automated fashion. DESCRIPTION: Manual measurement of passive devices requires a large amount of human resources to comp ...

    SBIRPhase I/Phase IIDepartment of DefenseDefense Microelectronics Activity
  6. DMEA192-D01: Backside Inspection Frontside Electrical Stimulation System

    Release Date: 05-02-2019Open Date: 05-31-2019Due Date: 07-01-2019Close Date: 07-01-2019

    TECHNOLOGY AREA(S): Sensors, Electronics, Battlespace OBJECTIVE: Develop a semiconductor device Fault Isolation tool that works across a wide range of technology processes. DESCRIPTION: Infrared (IR) Microscopes are used in the Failure Analysis (FA) and Fault Isolation (FI) of silicon-based semiconductor devices because of the fact that silicon is transparent to near-IR (NIR) light. Some of thes ...

    SBIRPhase I/Phase IIDepartment of DefenseDefense Microelectronics Activity
  7. DMEA182-003: BlockChain Supply Chain Enhancement for Trusted & Assured FPGA’s and ASICs

    Release Date: 04-20-2018Open Date: 05-22-2018Due Date: 06-20-2018Close Date: 06-20-2018

    TECHNOLOGY AREA(S): Sensors, Electronics OBJECTIVE: Develop an affordable and highly secure Supply Chain Risk Management (SCRM) system enhanced by blockchain technology. DESCRIPTION: Trusted & Assured microelectronics supply chains are globally distributed and offer many opportunities for supply chain interdiction and compromise by adversaries. An opportunity exists to establish a State of the ...

    SBIRPhase I/Phase IIDepartment of DefenseDefense Microelectronics Activity
  8. DMEA172-001: Computerized Automatic Delayering and Polishing System

    Release Date: 04-21-2017Open Date: 05-23-2017Due Date: 06-21-2017Close Date: 06-21-2017

    TECHNOLOGY AREA(S): Sensors OBJECTIVE: Develop a tool for automated, procedural delayering and polishing of semiconductor microelectronic devices DESCRIPTION: Sample preparation, in the world of semiconductor microelectronic devices, has proved to be one of the most critical aspects of Failure Analysis (FA), Fault Isolation (FI), and Reverse Engineering (RE). In addition to its criticality, it g ...

    SBIRPhase I/Phase IIDepartment of DefenseDefense Microelectronics Activity
  9. DMEA20A-001: Correlation between Nano-scale Material Properties and Macro-scale Electrical Properties of Radiation Hardened Materials

    Release Date: 12-10-2019Open Date: 01-14-2020Due Date: 02-12-2020Close Date: 02-26-2020

    TECHNOLOGY AREA(S): Materialssensors, Electronics, Space, Platforms, Nuclear OBJECTIVE: Develop and validate predictive electronic device behavioral models by systematically correlating nano-scale material properties (e.g. through quantitative electron microscopy techniques) with macro-scale electrical properties determined via device electrical testing. DESCRIPTION: Radiation hardening, the pr ...

    STTRPhase I/Phase IIDepartment of DefenseDefense Microelectronics Activity
  10. DMEA241-002: Development of Versatile Wafer Probe System for High Power Devices

    Release Date: 11-29-2023Open Date: 01-03-2024Due Date: 02-21-2024Close Date: 02-21-2024

    OUSD (R&E) CRITICAL TECHNOLOGY AREA(S): Microelectronics The technology within this topic is restricted under the International Traffic in Arms Regulation (ITAR), 22 CFR Parts 120-130, which controls the export and import of defense-related material and services, including export of sensitive technical data, or the Export Administration Regulation (EAR), 15 CFR Parts 730-774, which controls du ...

    SBIRPhase I/Phase IIDepartment of DefenseDefense Microelectronics Activity
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